How can coating and etching processes be made more efficient, robust, and data-driven? This question was the focus of the industry workshop “Plasma Process Simulation Tools for Industrial Coating and ...
A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...
Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...
A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoSâ‚‚), a next-generation ...
present in the plasma environment are a result of the response of the initial surface to the incident species profile. It is likely that certain specific surfaces may be produced only in the plasma ...
Silicon wafers aren't the only things that lose material in the various etching steps of IC manufacturing. The clamp rings which hold the wafers also erode during the process. Plastic clamp rings are ...
The fundamentals of a good Bosch etching system are described below; There are a number of significant features of the equipment used for Bosch processing which differ from normal ICP systems: In ...
Several etch vendors are starting to ship next-generation selective etch tools, paving the way for new memory and logic devices. Applied Materials was the first vendor to ship a next-gen selective ...
The database for surface reactions relevant to plasma processing of silicon is also highly dispersed. Useful information is included in several well-known texts, 33 refereed journals, symposia ...
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